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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

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Shaanxi Peakrise Metal Co.,Ltd
City:baoji
Province/State:Shaanxi
Country/Region:china
Contact Person:MrsNicole
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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

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Brand Name :PRM
Model Number :Custom
Certification :ISO9001
Place of Origin :China
MOQ :1pc
Price :Negotiate
Payment Terms :T/T
Supply Ability :5tons/month
Delivery Time :5~7days
Packaging Details :Plywood case
Name :Tantalum Rotating Target
Grade :RO5200,RO5400,RO5252,RO5255,Ta1 ,Ta2
Density :16.68 g/cm3
Atomic weight :180.94788
Sputtering method :DC
Thermal Conductivity :57 W/m.K
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Product Information:

Tantalum tube target is a tubular tantalum target, also known as tantalum rotating target.

Name Tantalum Rotating Target Tantalum Tube Target
Purity ≥99.95%
Grade RO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Density 16.68g/cm3
Atomic weight 180.94788
Sputtering method DC
Thermal conductivity 57 W/m.K
Thermal expansion coefficient 6.3 x 10-6 /K
Size OD: 20~300mm Wall thickness: ≥ 0.5mm

RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVDRO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

Application of Ta Rotating Target:

Tantalum tube target is a high-purity tantalum raw material for sputter deposition, which can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Details are as follows:


-For semiconductors;
-Chemical Vapor Deposition (CVD) displays;
-Physical Vapor Deposition (PVD) displays;
-Optical applications.

Note: We provide customized services. If you can't find the target you want, please contact us directly. We can customize according to your requirements.

RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

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