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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

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Shaanxi Peakrise Metal Co.,Ltd
City:baoji
Province/State:Shaanxi
Country/Region:china
Contact Person:MrsNicole
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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

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Brand Name :PRM
Model Number :Custom
Certification :ISO9001
Place of Origin :China
MOQ :1pc
Price :Negotiate
Payment Terms :T/T
Supply Ability :5tons/month
Delivery Time :5~7days
Packaging Details :Plywood case
Name :PVD coating Tantalum target
Grade :Ta1 Ta2 RO5200 RO5400 RO5252 RO5255
Purity :≥99.95%
Density :16.68g/cm3
Surface :machined surface
Standard :ASTM B708
Delivery status :Annealed
Shape :Flat target Rotating target Special-shaped customization
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Product Information:

Name PVD coating tantalum target
Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255
Purity ≥99.95%
Density 16.68g/cm3
Surface Machined surface, no pits, scratches, stains, burrs and other defects
Standard ASTM B708
Shape Flat target, Rotating target ,Special-shaped customization

PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical CoatingPVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

Chemical Content of PVD Coating Tantalum Target:

Grade Main elements   Impurity content less than %
  Ta Nb Fe Si Ni W Mo Ti Nb O C H N
Ta1 Remain —— 0.005 0.005 0.002 0.01 0.01 0.002 0.04 0.02 0.01 0.0015 0.01
Ta2 Remain —— 0.03 0.02 0.005 0.04 0.03 0.005 0.1 0.03 0.01 0.0015 0.01
TaNb3 Remain <3.5 0.03 0.03 0.005 0.04 0.03 0.005 —— 0.03 0.01 0.0015 0.01
TaNb20 Remain 17.0~23.0 0.03 0.03 0.005 0.04 0.03 0.005 —— 0.03 0.01 0.0015 0.01
Ta2.5W Remain   0.005 0.005 0.002 3 0.01 0.002 0.04 0.02 0.01 0.0015 0.01
Ta10W Remain   0.005 0.005 0.002 11 0.01 0.002 0.04 0.02 0.01 0.0015 0.01

Feature of PVD Tantalum Target:

High melting point,
Low steam pressure,
Good cold working performance,
High chemical stability,
Strong resistance to liquid metal corrosion,
The surface oxide film has a large dielectric constant

Application:

The tantalum target and the copper back target are welded, and then semiconductor or optical sputtering is performed, and the tantalum atoms are deposited on the substrate material in the form of oxides to achieve sputtering coating; tantalum targets are mainly used in semiconductor coating, optical coating and other industries . In the semiconductor industry, metal (Ta) is currently mainly used to coat and form a barrier layer through physical vapor deposition (PVD) as a target material.

We can process according to customer's drawing, and produce Ta rod,plate,wire,foil,crucible etc.


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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating

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