Shaanxi Peakrise Metal Co.,Ltd
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High Purity Sputter Coating Tantalum Target Tantalum Disc Target
1. Specifications Of Sputter Coating Tantalum Target:
Sputter Coating Tantalum Target
Material: R05200, R05400, R05252 (Ta-2.5W), R05255 (Ta-10W)
Circular targets: Dia 25mm ~ 400mm x Thickness 3mm ~ 28mm
Rectangular targets: Thickness 1mm ~ 12.7mm x Width < 600mmx Length < 2000mm
Purity: >=99.95% or 99.99%
Surface: bright,polished
Condition: annealed
We can also process according to your request.
| Grade | 3N, 3N5, 4N, with Ta 99.99%min |
| Recrystallization | 95%min |
| Grain size | ASTM 4 or finer |
| Surface finish | 16Rms max. or Ra 0.4 ( RMS64 or better) |
| Flatness | 0.1mm or 0.15% max |
| Tolerance | +/-0.010" on all dimensions |
2. Chemical Composition Of Sputter Coating Tantalum Target:
3. Application Of Sputter Coating Tantalum Target:
Tantalum sputtering target is a tantalum sheet obtained through pressure processing. It has high chemical purity, small grain size, recrystallized structure and good consistency in three axes. It is mainly used in optical fibers, semiconductor wafers and integrated circuits. For sputter deposition coatings, tantalum targets can be used for cathode sputtering coatings, high vacuum getter active materials, etc., and are important materials for thin film technology.
4. Advantage of our Sputter Coating target:
- polised surface with high quality.
- uniform grain with densified microstructure ensures longer use time.
- professional after-sales service.
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