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10.2g/Cm3 Molybdenum Products Chemical Properties Molybdenum Target Molybdenum Plate Target Molybdenum Disc High Purity

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Shaanxi Peakrise Metal Co.,Ltd
City:baoji
Province/State:Shaanxi
Country/Region:china
Contact Person:MrsNicole
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10.2g/Cm3 Molybdenum Products Chemical Properties Molybdenum Target Molybdenum Plate Target Molybdenum Disc High Purity

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Brand Name :PRM
Model Number :custom
Certification :ISO9001
Place of Origin :China
MOQ :1kg
Price :$50~200/kg
Payment Terms :T/T
Supply Ability :2000kgs/month
Delivery Time :7~10 work days
Packaging Details :Plywood case
Name :Chemical Properties And Applications Of Molybdenum Target
Material :Molybdenum and molybdenum alloy
Density :10.2g/cm3
Purity :99.95%
Surface :Polished
MOQ :1kg
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Chemical Properties And Applications Of Molybdenum Target

1.Chemical Properties Of Molybdenum Target:

The chemical properties of molybdenum targets are relatively stable. At room temperature, it is stable in air or water, but slight oxidation occurs when the temperature reaches 400 °C, and violent oxidation occurs when the temperature reaches 600 °C to form MoO3. Hydrochloric acid, hydrofluoric acid, dilute nitric acid and alkaline solutions do not react with the target, but they can be dissolved in nitric acid, aqua regia or hot sulfuric acid solutions.

Medium Experimental conditions Reaction
Water Does not corrode
HF Cold,Hot Does not corrode
HF+H2SO4 Cold Does not corrode
Hot slight corrosion
HF+Aqua regia Cold slight corrosion
Hot Corrosion rapidly
HF+HNO3 Cold,Hot Corrosion rapidly
Ammonia Does not corrode
Molten alkali In the atmosphere slight corrosion
Oxidizing agents such asKNO3/KNO/Kcl3/PbO2 Corrosion rapidly
Boron at high temperature generate borides
C Above 1100℃ form carbide
Si Above 1100℃ generate silicide
P to maximum temperature Does not corrode
S Above 440℃ form sulfide
iodine Above 790℃ Does not corrode
Bromine Above 840℃ Does not corrode
Chlorine Above 230℃ strong corrosion
Fluorine Room temperature strong corrosion
Air and oxygen 400℃ start to oxidize
600℃ strong oxidation
Above 700℃ MoO3sublimation
Hydrogen and noble gases to maximum temperature not responding
CO Above 1400℃ form carbide
CO2 1200℃ oxidation
Hydrocarbons 1100℃ form carbide
Al,Ni,Fe,Co,Sb melt strong corrosion
Zn melt slight corrosion
Bi melt Highly corrosive
Glass melt Highly corrosive
Refractory oxideAl2O3,ZrO2,BeO,MgO,ThO2 1700℃ Does not corrode

10.2g/Cm3 Molybdenum Products Chemical Properties Molybdenum Target Molybdenum Plate Target Molybdenum Disc High Purity10.2g/Cm3 Molybdenum Products Chemical Properties Molybdenum Target Molybdenum Plate Target Molybdenum Disc High Purity

2. Applictaion Of Molybdenum Target:

1.)The use of molybdenum sputtering targets on flat panel displays.


In the electronics industry, the use of molybdenum sputtering targets mainly includes flat panel displays, thin-film solar cell electrodes and wiring materials, and semiconductor barrier materials. These materials are based on molybdenum and have a high melting point, high electrical conductivity, low specific impedance, good resistance to Corrosive and good environmental performance. Molybdenum has the advantages of only half the specific resistance and film stress of chromium, and has no environmental pollution problems, so it has become one of the preferred materials for sputtering targets for flat panel displays. In addition to this, the use of molybdenum in the components of liquid crystal displays can greatly improve the performance of liquid crystal displays in terms of brightness, contrast, color and longevity.

In the flat panel display business, TFT-LCDs are one of the primary commercial applications for molybdenum sputtering targets. According to market research, LCD development will reach its peak in the coming years, with an average annual growth rate of roughly 30%. With the advancement of LCD, the demand for LCD sputtering targets will also rise quickly, at a rate of roughly 20% every year.

2.)Application of Molybdenum Sputtering Target in Thin Film Solar Photovoltaic Cells.

In addition to the flat panel display industry, with the development of the new energy industry, the use of molybdenum sputtering targets on thin-film solar photovoltaic cells is also increasing.

CIGS solar cells are a crucial kind of solar cell that are used to turn sunlight into electricity. Four elements make up CIGS: selenium (Se), gallium (Ga), indium (In), and copper (Cu) (Se).Its full name is copper indium gallium selenide thin film solar cells. Strong light absorption, good power generation stability, high conversion efficiency, long daytime power generation times, huge power generation, low production costs, and other benefits are all associated with CIGS.and short energy recovery period.

The molybdenum target is mainly formed by sputtering to form the electrode layer of the CIGS thin film battery. Molybdenum is located at the solar cell's base. The nucleation, development, and shape of CIGS thin film crystals are significantly influenced by this contact, which serves as the rear contact of solar cells.


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10.2g/Cm3 Molybdenum Products Chemical Properties Molybdenum Target Molybdenum Plate Target Molybdenum Disc High Purity

10.2g/Cm3 Molybdenum Products Chemical Properties Molybdenum Target Molybdenum Plate Target Molybdenum Disc High Purity

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